WASHING METHOD FOR INSIDE OF HIGH PURITY CHEMICAL FEED APPARATUS AND HIGH PURITY CHEMICAL FEED APPARATUS

PROBLEM TO BE SOLVED: To provide a washing method for the inside of a high purity chemical feed apparatus capable of easily washing even a large sized device or the like and causing no problem of contamination, and to provide a high purity chemical feed apparatus. SOLUTION: The high purity chemical...

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Hauptverfasser: ICHISHITA JUNGO, KAWAJIRI KOJI, TAKIZAWA SHIRO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a washing method for the inside of a high purity chemical feed apparatus capable of easily washing even a large sized device or the like and causing no problem of contamination, and to provide a high purity chemical feed apparatus. SOLUTION: The high purity chemical feed apparatus is provided with a vessel body 1 made of a stainless steel of which an inner surface is subjected to electrolytic polishing; and a lid part 2 joined to the vessel body. When the inner surface of the high purity chemical feed apparatus provided with a high purity chemical pouring means 3 for pouring the high purity chemical into the vessel body 1 and a high purity chemical feed means 4 for taking out the high purity chemical from the vessel body 1 is washed, a washing liquid is sprayed to the inner surfaces of the vessel body 1 and the lid part 2 by a washing liquid spraying means 5 provided on the high purity chemical feed apparatus 10. COPYRIGHT: (C)2004,JPO