CHEMICAL SUPPLY DEVICE FOR FLUSH TOILET

PROBLEM TO BE SOLVED: To provide a chemical supply device capable of enhancing the persistence of chemicals and preventing chemical clogging. SOLUTION: The chemical supply device comprises a lower member 3 with a chemical placement part, and an upper member 2 fitted over the lower member 3 with a ch...

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1. Verfasser: NAGANOBU HIROMICHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a chemical supply device capable of enhancing the persistence of chemicals and preventing chemical clogging. SOLUTION: The chemical supply device comprises a lower member 3 with a chemical placement part, and an upper member 2 fitted over the lower member 3 with a chemical storage space secured between the upper member and the lower member 3. The chemical placement part comprises a number of upstanding pieces formed on the bottom face of the lower member 3. The lower member 3 and the upper member 2 fit together at their peripheral edges. Flush water is taken in from the peripheral edges. The lower member 3 has a downwardly extending discharge cylinder 33 at the center of its bottom face and has at the back of its bottom face a support piece 322 connected to the upper end of the discharge cylinder 33 for supporting the lower member 3 floated above a discharge opening. A through opening is formed in the bottom face of the lower member 3. A cutout 332 is formed at the upper end of the discharge cylinder 33. COPYRIGHT: (C)2004,JPO