FILM DEPOSITION METHOD, FILM DEPOSITION APPARATUS, OPTICAL ELEMENT, AND PROJECTION ALIGNER

PROBLEM TO BE SOLVED: To provide a film deposition method, a film deposition apparatus, an optical element, and a projection aligner of high time efficiency for omitting an atmosphere opening step of a vacuum vessel to exchange a masking means, and exchanging the masking means according to a thin fi...

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Bibliographische Detailangaben
1. Verfasser:	MURAKAMI ATSUNOBU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY CINEMATOGRAPHY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a film deposition method, a film deposition apparatus, an optical element, and a projection aligner of high time efficiency for omitting an atmosphere opening step of a vacuum vessel to exchange a masking means, and exchanging the masking means according to a thin film material and a substrate while evacuating the vacuum vessel. SOLUTION: The time efficiency is improved by storing a masking means in a vacuum vessel, and exchanging a masking means according to a thin film material and a substrate with a masking means stored in the vacuum vessel while the vacuum vessel is evacuated. COPYRIGHT: (C)2004,JPO