GAS BARRIER FILM

PROBLEM TO BE SOLVED: To provide a packaging material which has high gas-barrier properties and maintains the gas-barrier properties even after a hot water treatment. SOLUTION: The gas barrier film with a silicon oxide thin film on a polyester film has a thin film thickness of 0.5 to 40nm and a thin...

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Bibliographische Detailangaben
Hauptverfasser:	OKAWARA CHIHARU, YAMAGAMI KANAKO, YOSHIDA SHIGENOBU
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a packaging material which has high gas-barrier properties and maintains the gas-barrier properties even after a hot water treatment. SOLUTION: The gas barrier film with a silicon oxide thin film on a polyester film has a thin film thickness of 0.5 to 40nm and a thin film surface roughness Rms in the area of 10 μm square of 3nm or more. This enables specifying the surface of the thin film after the retort treatment by the shape of wrinkles to be observed under an atomic force microscope. COPYRIGHT: (C)2004,JPO