DEVICE MANAGEMENT METHOD, EXPOSURE METHOD, LITHOGRAPHY SYSTEM, AND PROGRAM

PROBLEM TO BE SOLVED: To efficiently obtain a high-accuracy superposition exposure process by the use of a plurality of projection exposure devices. SOLUTION: A management device 130 stores distortions of projected images due to positional deviations of a plurality of measuring points transmitted from the plurality of projection exposure devices 1101to 110N in the database of a storage device 140. The management device 130 forms groups selected from the projection exposure devices 1101to 110N in which the maximum distortion difference among the projection exposure devices at the measuring points stays within a tolerance and stores the groups in the database in the storage device 140. A host computer 160 queries the management device 130 as to the group containing the projection exposure devices of the original process and selects exposure devices out of the group to perform the superposition exposure process. Therefore, the superposition exposure process is efficiently carried out with high superposition accuracy through this lithography system 100 even when the projection exposure devices 1101to 110N are used. COPYRIGHT: (C)2004,JPO