POLYAMIDE BLOCK COPOLYMER, METHOD FOR PRODUCING THE SAME, AND EPOXY RESIN COMPOSITION USING THE SAME

PROBLEM TO BE SOLVED: To provide a polyamide block copolymer reduced in a long-term change such as gelation without detriment to its excellent ability to improve a cured epoxy resin when used in conjunction with an epoxy resin. SOLUTION: The polyamide block copolymer is represented by formula I: X-C...

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Hauptverfasser: SHIMURA KATSUNORI, KOGO MAKIKO, UCHIDA MAKOTO, IMAIZUMI MASAHIRO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a polyamide block copolymer reduced in a long-term change such as gelation without detriment to its excellent ability to improve a cured epoxy resin when used in conjunction with an epoxy resin. SOLUTION: The polyamide block copolymer is represented by formula I: X-CONH-R1-NH(CO-R2-CONH-R1-NH)n-[äCO-A-CONH-R1-NH-(CO-R2-CONH- R1-NH)n}m]-CO-X (wherein A is a divalent oligomer structure; R1 and R2 are each a divalent organic group; X is an optionally substituted alkyl group or an optionally substituted aryl group; m and n are each the degree of polymerization; n is 1-30; and m is 1-20). COPYRIGHT: (C)2004,JPO