POLISHING WOVEN FABRIC, USE OF THE SAME, AND UTILIZING METHOD OF THE SAME

PROBLEM TO BE SOLVED: To provide a high efficiency texture tape improved in its polishing material-retaining property and capable of capturing polishing dusts therein. SOLUTION: This texture tape comprises polishing woven fabric composed of (A) polyester wefts each having a cross-sectional shape hav...

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Bibliographische Detailangaben
Hauptverfasser: NARUSE TSUTOMU, UEDA HIDEO, NAKAGAWA KAZUYOSHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a high efficiency texture tape improved in its polishing material-retaining property and capable of capturing polishing dusts therein. SOLUTION: This texture tape comprises polishing woven fabric composed of (A) polyester wefts each having a cross-sectional shape having three or more apex angles and (B) polyamide wefts, wherein the single filament finenesses of polyester wefts and polyamide wefts are respectively 0.05-0.1 dtex and 0.02-0.05 dtex, a single fiber area ratio of polyester : polyamide of the wefts is 1:1 through 4:1, and a cover factor value of the wefts is 40000 or more. COPYRIGHT: (C)2004,JPO