ANTIFUNGAL LOW IRRITATIVE COSMETIC

PROBLEM TO BE SOLVED: To provide a cosmetic not exhibiting primary irritation and sensitizing potential to the skin, and also not imparting a stinging pain or unpleasant feeling such as irritating sensation or pricking sensation in application to the skin, exhibiting an effective antifungal property...

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Bibliographische Detailangaben
Hauptverfasser: MORI HIDEJI, OGAWA ATSUKO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a cosmetic not exhibiting primary irritation and sensitizing potential to the skin, and also not imparting a stinging pain or unpleasant feeling such as irritating sensation or pricking sensation in application to the skin, exhibiting an effective antifungal property free from reduction of the antifungal activity by formulating a cosmetic base and other formulating components. SOLUTION: The antifungal low irritative cosmetic is formulated with an extract of vegetables belonging to Salicaceae and one or more than two kinds of compounds selected from the group consisting of ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, 1,3-butylene glycol, 1,2-pentandiol, 3-methyl-1,3-butanediol, hexylene glycol, digycerin, an alkyl ether of a polyalcohol, parahydroxybenzoate esters, phenoxyethanol, photosensitive dye No.101, photosensitive dye No.201, photosensitive dye No.401, hinokitiol, its derivatives and their salt, an N-long chain acyl basic amino acid derivative and its acid addition salt or zinc oxide. COPYRIGHT: (C)2004,JPO