DEVICE AND METHOD FOR TREATING SURFACE BY ELECTRIC DISCHARGE

PROBLEM TO BE SOLVED: To solve a conventional problem that the surface roughness of a formed film becomes 7 μm or above in the ten-point system of average roughness Rz if the voltage for starting discharge is set at 60 V-100 V, in a device for surface treatment by electric discharge such that an ele...

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Hauptverfasser:	GOTO AKIHIRO, OTSUTA KATSUHISA, AKIYOSHI MASAO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To solve a conventional problem that the surface roughness of a formed film becomes 7 μm or above in the ten-point system of average roughness Rz if the voltage for starting discharge is set at 60 V-100 V, in a device for surface treatment by electric discharge such that an electrode material is deposited on the surface of a workpiece by pulse discharge. SOLUTION: The device for surface treatment by electric discharge produces a smooth and uniform surface film layer having 6 μm or below in the ten-point system of average roughness Rz by setting the voltage for starting the pulse discharge at 120 V or above. A similar effect can be obtained by setting the starting voltage with a high and a low voltage combined periodically. COPYRIGHT: (C)2004,JPO