REGION SELECTIVE DEPOSITION METHOD

PROBLEM TO BE SOLVED: To provide a region selective deposition method which can exactly deposit compounds, etc., to the desired regions of a base material. SOLUTION: A solution is brought into contact with the base material which has the first region having first surface free energy and the second r...

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Bibliographische Detailangaben
Hauptverfasser:	MASUDA YOSHITAKE, KAWAMOTO KUNIHITO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY CINEMATOGRAPHY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a region selective deposition method which can exactly deposit compounds, etc., to the desired regions of a base material. SOLUTION: A solution is brought into contact with the base material which has the first region having first surface free energy and the second region having second surface free energy to deposit the components included in this solution only in the first region. For example, a film having a photosensitive hydrophobic group is formed on a substrate and is irradiated with light to form hydrophilic patterns and the foam of the solution is brought into contact with the top of the hydrophilic patterns to deposit metal oxides on the hydrophilic patterns by the components included in the solution. COPYRIGHT: (C)2004,JPO