MANUFACTURING METHOD FOR HIGH-EFFICIENCY PHOTOCATALYTIC TITANIUM DIOXIDE THIN FILM

PROBLEM TO BE SOLVED: To manufacture a titanium dioxide thin film having high photocatalysis by controlling a crystalline structure of the titanium dioxide by applying a laser vapor deposition method capable of manufacturing a smooth film in a thickness of tens of nm and a head treatment thereafter....

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Bibliographische Detailangaben
1. Verfasser:	YAMAMOTO HARUYA
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To manufacture a titanium dioxide thin film having high photocatalysis by controlling a crystalline structure of the titanium dioxide by applying a laser vapor deposition method capable of manufacturing a smooth film in a thickness of tens of nm and a head treatment thereafter. SOLUTION: This is a method for manufacturing a high-efficiency photocatalystic titanium dioxide thin film by applying the heat treatment in the air to a noncrystalline titanium dioxide thin film formed on a silicon (Si) substrate, a silica glass (SiO2) substrate, a sapphire (a-Al2O3) substrate, a magnesium oxide (MgO) substrate, a strontium titanate (SrTiO3) substrate, a lanthanum aluminate (LaAlO3) substrate or a lithium niobate (LiNbO3) substrate in an atmosphere of oxygen by the laser vapor deposition method. The noncrystalline titanium dioxide thin film is formed by evaporating onto the substrate under the conditions that the oxygen gas pressure during vapor deposition is controlled at 6.7 Pa-13.3 Pa and that the room temperature is 20°C. The high-efficiency photocatalytic titanium dioxide thin film is formed by applying the heat treatment for 1-2 hours at 500°C-700°C of heating temperature in the air, and the high photocatalysis is provided by making the thickness of the titanium dioxide thin film of 200 nm or more. COPYRIGHT: (C)2004,JPO