PLASMA CORROSION RESISTING SILICA GLASS, MANUFACTURING METHOD THEREFOR AND APPARATUS USING THE SAME

PROBLEM TO BE SOLVED: To provide a silica glass, used for a semiconductor container, a tool, a bell jar for a plasma etcher, and the like, which has plasma resistance, particularly sufficient durability to fluorine plasma such as CF4/Ar/O2plasma, is free from metal contamination and has high viscosity at high temperatures, and to provide a method for producing the same and apparatuses for manufacturing a semiconductor or a liquid crystal comprising the plasma corrosion resisting silica glass. SOLUTION: The plasma corrosion resisting silica glass essentially comprising SiO2as a glass forming substance comprises aluminum in an amount from more than 10 atomic % to 20 atomic %. The method for producing the plasma corrosion resisting silica glass and apparatuses using the same are provided. COPYRIGHT: (C)2004,JPO