FORMATION METHOD OF MULTILAYER THIN FILM PATTERN REQUIRING NO MASK ALIGNMENT NOR PHOTOLITHOGRAPHY PROCESS

PROBLEM TO BE SOLVED: To provide a method for manufacturing a solar cell comprising a multilayer film cell which requires no mask alignment each time nor atmosphere releasing, whereas, in a method for manufacturing a solar cell comprising a multilayer thin film cell, a plurality of times of masking and film-forming operation thereafter are required with a different mask required to be accurately aligned each time, atmosphere releasing is required each time for taking in/out an object to be processed, and multiple times of exhausting of a film forming chamber and scavenging management for a next film forming process are laborious. SOLUTION: A multilayer thin film pattern formation mask 15 is held against, with a fixed interval, a base 1 forming a multilayer thin film cell, on which material vapor beam of direct-advancing is made incident alternately at a different and appropriate angle for each material. Thus, wanted multilayer thin film patterns 4, 7, 9, 11, and 14 are formed. The above operations are performed as inline continuous process. COPYRIGHT: (C)2003,JPO