HIGH-OUTPUT ION SPUTTERING MAGNETRON

HIGH-OUTPUT ION SPUTTERING MAGNETRON

PROBLEM TO BE SOLVED: To provide a high-output ion sputtering magnetron which is hardly affected by the thermal damage arising from magnetic induction heating. SOLUTION: A rotary cathode of the high-output ion sputtering magnetron provided with the rotary cathode internally includes conductive compo...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: CROWLEY DANIEL T
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a high-output ion sputtering magnetron which is hardly affected by the thermal damage arising from magnetic induction heating. SOLUTION: A rotary cathode of the high-output ion sputtering magnetron provided with the rotary cathode internally includes conductive components made of a conductive material so as to pass an electric current to the rotary cathode from a power source. The ion sputtering magnetron has an electromagnetic field shield arranged between the conductive component and a drive shaft segment. The electromagnetic field shield is made of an electromagnetic field permeable material such as an iron material, to reduce the thermal damage to the parts which are adjacent to the rotary cathode and are liable to be affected by the magnetic induction heating. COPYRIGHT: (C)2003,JPO