OPTICAL METHOD AND APPARATUS FOR PARTICLE DISPLACEMENT

PROBLEM TO BE SOLVED: To provide an optical method and an optical apparatus for displacement of particles (P). SOLUTION: The optical apparatus for displacement of the particles (P) is provided with both a substrate (6) in which at least one strip (5) made of at least one thin film is accumulated and...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	CHATON PATRICK, GETIN STEPHANE
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DEVICES USING STIMULATED EMISSION ELECTRICITY GAMMA RAY OR X-RAY MICROSCOPES INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES IRRADIATION DEVICES MEASURING NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR TESTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an optical method and an optical apparatus for displacement of particles (P). SOLUTION: The optical apparatus for displacement of the particles (P) is provided with both a substrate (6) in which at least one strip (5) made of at least one thin film is accumulated and the strip (5) having an optical thickness gradient along its axis line so that the displacement of the particles (P) may occur along the axis line of the strip (5) when electromagnetic waves (L) inadiate the apparatus. This invention may be applied to the classification and/or analysis of the particles. COPYRIGHT: (C)2003,JPO