SUBSTRATE TREATMENT UNIT

PROBLEM TO BE SOLVED: To provide a substrate treatment unit with its cleaning performance improved by shortening dead time during a period up to a cleaning step. SOLUTION: A cleaning unit 10 and a calcination unit 20 face each other with a transfer route between them, where a transfer robot TR is ar...

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1. Verfasser: OTANI MASAMI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a substrate treatment unit with its cleaning performance improved by shortening dead time during a period up to a cleaning step. SOLUTION: A cleaning unit 10 and a calcination unit 20 face each other with a transfer route between them, where a transfer robot TR is arranged, both positioned at the same height. The cleaning unit 10 has a surface scrubber SS and a rear surface scrubber SSR, and the calcination unit 20 performs plasma-aided calcination. A substrate W which is an object to be treated is transferred by a transfer robot TR in the order of an indexer ID, the calcination unit 20, a reverser 50, and the cleaning unit 10, and is then returned to the indexer ID. The immediate transfer of the calcinated substrate W to the cleaning unit 10 shortens the time from calcination to cleaning. This eliminates dead time and, because cleaning is performed immediately after calcination, improves the cleaning performance of the cleaning unit 10. COPYRIGHT: (C)2003,JPO