THERMOELECTRON PLASMA GENERATOR

PROBLEM TO BE SOLVED: To provide a thermoelectron high density plasma generator particularly for generating thermoelectrons to form high density plasma to assist high speed film deposition by reactive sputtering. SOLUTION: In the gun type plasma generator for generating the thermoelectrons, an appar...

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Bibliographische Detailangaben
Hauptverfasser:	YAMADA TAKAHARU, KITAHATA AKIHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a thermoelectron high density plasma generator particularly for generating thermoelectrons to form high density plasma to assist high speed film deposition by reactive sputtering. SOLUTION: In the gun type plasma generator for generating the thermoelectrons, an apparatus main body is constituted of a cylindrical body having an opening part on the anode side, an induction coil wound around the outer circumference of the cylindrical body, an inert gas introducing pipe and a thermoelectron source provided inside the cylindrical body. A reactive gas introducing pipe for releasing a reactive gas apart from the emission of the plasma is provided inside the thermoelectron source, and the high density plasma is generated between the opening part and an anode connected to the anode of an accelerating power source to form a large amount of plasma flux. COPYRIGHT: (C)2003,JPO