DISCHARGE PLASMA PROCESSING DEVICE

PROBLEM TO BE SOLVED: To provide a discharge plasma processing device using plate electrodes capable of fixing a workpiece between the electrodes for uniformly processing it and restraining generation of the arc discharge. SOLUTION: In this plasma processing device, an electric field is impressed be...

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1. Verfasser: MIZUOCHI HIROYUKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a discharge plasma processing device using plate electrodes capable of fixing a workpiece between the electrodes for uniformly processing it and restraining generation of the arc discharge. SOLUTION: In this plasma processing device, an electric field is impressed between a pair of opposed plate electrodes under a pressure close to an atmospheric pressure, and a glow discharge plasma is generated for processing the workpiece arranged between the electrodes. In this plasma processing device, at least one plate electrode is provided with a plurality of holes, into which solid dielectric pipes are inserted, and the discharge face side is coated with a solid dielectric body. COPYRIGHT: (C)2003,JPO