SEMICONDUCTOR MANUFACTURING APPARATUS AND MAINTENANCE METHOD

PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus and a maintenance method capable of easily conducting the maintenance of the apparatus. SOLUTION: The apparatus is provided with a semiconductor treatment device 1 formed by modularizing a load lock chamber, a conveying chamber...

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Bibliographische Detailangaben
Hauptverfasser: WATABE TSUYOSHI, YAMAGISHI TAKAYUKI, SUWADA MASAE
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus and a maintenance method capable of easily conducting the maintenance of the apparatus. SOLUTION: The apparatus is provided with a semiconductor treatment device 1 formed by modularizing a load lock chamber, a conveying chamber and a reaction chamber; a main frame 31; an independent chamber frame 32 for mounting the semiconductor treatment device; a sliding mechanism for smoothly and detachably mounting the chamber frame one main frame; and a positioning mechanism for fixing a position of the chamber frame in the main frame. The modularized semiconductor manufacturing apparatus is installed detachably in the main frame. COPYRIGHT: (C)2003,JPO