ALIGNER AND METHOD FOR ALIGNMENT

PROBLEM TO BE SOLVED: To realize high throughput by speeding up alignment. SOLUTION: In an aligner, detecting means 6A-6D to detect a positioning mark provided at the outside of the pattern area of a mask M and a positioning mark provided at an exposure object substrate P at the step moving position...

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Bibliographische Detailangaben
Hauptverfasser:	TAKAHASHI SATOSHI, KOMATSU NOBUHISA, SATO RIYUUGO, NEMOTO RYOJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To realize high throughput by speeding up alignment. SOLUTION: In an aligner, detecting means 6A-6D to detect a positioning mark provided at the outside of the pattern area of a mask M and a positioning mark provided at an exposure object substrate P at the step moving position of the substrate and moving means 7A-7D to move the detecting means to a mark detecting position are moved to the mark detecting position by a controlling means during the step movement of the substrate or during exposure. COPYRIGHT: (C)2003,JPO