DEVICE FOR SEWING STITCH GROUP SEAM PATTERN

PROBLEM TO BE SOLVED: To realize a general type of a sewing device to reduce the structural requirement and simplify handling. SOLUTION: This device is provided for sewing a stitch group seam pattern in the longitudinal direction extending vertically or laterally of an edge of a raw material to be s...

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1. Verfasser: FRANSING HEINZ
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To realize a general type of a sewing device to reduce the structural requirement and simplify handling. SOLUTION: This device is provided for sewing a stitch group seam pattern in the longitudinal direction extending vertically or laterally of an edge of a raw material to be sewn. The device includes a table 10 having a slab 9 to which a worker side 16 is allocated. A support plate 17 is placed on the slab 9, and sewing machine is placed thereon through a base plate. The support plate 17 is rotatable between a first working position and a second working position around a pivot support part having a vertical axis 25 to the slab 9. Thus, the position of the sewing machine to the worker side can be changed at the right angle. COPYRIGHT: (C)2003,JPO