METHOD OF MANUFACTURING THIN FILM MAGNETIC HEAD

PROBLEM TO BE SOLVED: To provide a method of manufacturing a thin film magnetic head, a method of manufacturing a magneto-resistance effect element assembly, a method of manufacturing a head gimbal assembly and a method of manufacturing a hard disk device all of which are capable of realizing an ele...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: HADATE HITOSHI, KASAHARA HIROAKI, KAGOTANI TSUNEO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method of manufacturing a thin film magnetic head, a method of manufacturing a magneto-resistance effect element assembly, a method of manufacturing a head gimbal assembly and a method of manufacturing a hard disk device all of which are capable of realizing an electron beam lithography having high plotting accuracy. SOLUTION: In this method of manufacturing the thin film magnetic head, such a state is kept that a conductive member 50 is brought into contact with a magneto-resistance effect film 42 when an electron beam resist 49 is irradiated with an electron beam. Since parts whereon the magneto-resistance effect elements 40 are to be formed are electrically connected by the magneto- resistance effect film 42, electric charges accumulated around the individual formation positions by the irradiation with the electron beam can be lead to the outside through the conductive member 50. Thus, the rectilinear propagation property of the electron beam is not impaired, and the plotting accuracy for patterning the magneto-resistance effect film 42 by the electron beam lithography is improved. COPYRIGHT: (C)2003,JPO