SEMICONDUCTOR MANUFACTURING APPARATUS

PROBLEM TO BE SOLVED: To prevent generation of particles during forced cooling period, using the cooled air. SOLUTION: An inner tube 12, where the upper end thereof is formed as a closed cylindrical shape, and an exhaust port 15 is also formed at the lower end thereof, is accommodated at the interna...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	INOKUCHI YASUHIRO, SANBE MAKOTO, MORIYA ATSUSHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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