SEMICONDUCTOR DEVICE, FORMING METHOD FOR PATTERN FOR THE SEMICONDUCTOR DEVICE, MANUFACTURING METHOD FOR THE SEMICONDUCTOR, AND PATTERN FORMING DEVICE FOR THE SEMICONDUCTOR DEVICE
PROBLEM TO BE SOLVED: To realize stable operation of a circuit by effectively absorbing noises. SOLUTION: A semiconductor device has a bypass capacitor in MOS structure which is formed extending from a power wire area to below a free area where no other function layer is present adjacently to the po...
Gespeichert in:
Hauptverfasser: | , , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!