PHASE SHIFT MASK, METHOD FOR PRODUCING THE SAME AND PATTERN FORMING METHOD USING THE SAME

PROBLEM TO BE SOLVED: To provide a phase shift mask easy to produce and capable of forming a high-precision pattern. SOLUTION: The phase shift mask consists of a light transmissive substrate, a translucent film pattern formed on the surface of the light transmissive substrate and an organic film pat...

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1. Verfasser:	OKUBO HIDEO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a phase shift mask easy to produce and capable of forming a high-precision pattern. SOLUTION: The phase shift mask consists of a light transmissive substrate, a translucent film pattern formed on the surface of the light transmissive substrate and an organic film pattern formed on the surface of the light transmissive substrate or on the translucent pattern in such a way that the transmittance can be varied by irradiation with light. When a false pattern is generated in pattern formation, since the transmittance of the organic film pattern can easily be varied by irradiation with light, fine adjustment of the quantity of phase shift can easily be performed by varying the transmittance without varying the film thickness.