WET FRICTION MATERIAL AND MANUFACTURING METHOD FOR THE SAME

PROBLEM TO BE SOLVED: To provide a wet frictional material capable of preventing degradation of a porous friction material and having friction performance with excellent temporal stability and chemical resistance, and a manufacturing method for the wet frictional material. SOLUTION: This wet frictio...

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Bibliographische Detailangaben
1. Verfasser:	MOROZUMI HIROKI
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES BLASTING BRAKES CHEMISTRY CLUTCHES COUPLINGS FOR TRANSMITTING ROTATION DYES ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING LIGHTING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MECHANICAL ENGINEERING METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES THERMAL INSULATION IN GENERAL WEAPONS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a wet frictional material capable of preventing degradation of a porous friction material and having friction performance with excellent temporal stability and chemical resistance, and a manufacturing method for the wet frictional material. SOLUTION: This wet frictional material is provided with a silicon oxide film on a porous friction material containing an organic fibrous reinforcing base material, a friction conditioning agent and a bonding agent, and has 20-60% porosity. The silicon oxide film is produced from a polysilazane as a starting raw material. The porous friction material is formed by impregnating the bonding agent in a paper substrate material made of the organic fibrous reinforcing base material and the friction conditioning agent followed by vacuum drying. It is dipped in a solution containing a polysilazane, dried and baked to form a silicon oxide film on the porous friction material. This is a two-step baking method of baking at 80-250 deg.C.