GAS SUPPLYING APPARATUS AND METHOD THEREFOR, AND FILM FORMING APPARATUS AND METHOD THEREFOR

PROBLEM TO BE SOLVED: To individually supply each raw material of solution by vaporizing each material under an optimum vaporizing condition at the time of forming a composite metal oxide film by a solution vaporizing method using a multiple metal compound as the raw material. SOLUTION: The composit...

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Bibliographische Detailangaben
Hauptverfasser:	MAGARA TAKASHI, JINRIKI HIROSHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To individually supply each raw material of solution by vaporizing each material under an optimum vaporizing condition at the time of forming a composite metal oxide film by a solution vaporizing method using a multiple metal compound as the raw material. SOLUTION: The composite metal oxide film is formed by the reaction of gas composed of a plurality of multiple metal compounds and oxidation agent gas by introducing the gas into a film forming chamber 62 via a shower plate 64. The solution including a plurality of multiple metal compounds is individually vaporized with a vaporizer. The gas composed of a plurality of multiple metal compounds supplied from the vaporizer is uniformly mixed by a gas mixing unit 76 and then supplied to the shower plate 64.