POLISHING WOVEN FABRIC

PROBLEM TO BE SOLVED: To provide a high efficiency textured tape which has an improved polishing material-retaining property and can catch polishing dusts therein. SOLUTION: This textured tape comprises a polishing woven fabric which comprises (A) polyamide wefts each having a cross-sectional shape...

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Bibliographische Detailangaben
Hauptverfasser:	NARUSE TSUTOMU, UEDA HIDEO, NAKAGAWA KAZUYOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GENERAL PROCESSES OF COMPOUNDING GRINDING INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER LOOMS MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING METALLURGY METHODS OF WEAVING ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS PHYSICS POLISHING TEXTILES THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WEAVING WORKING-UP WOVEN FABRICS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a high efficiency textured tape which has an improved polishing material-retaining property and can catch polishing dusts therein. SOLUTION: This textured tape comprises a polishing woven fabric which comprises (A) polyamide wefts each having a cross-sectional shape having three or more apex angles and (B) polyester wefts, wherein the single filament finenesses of the polyamide wefts and the polyester wefts are 0.05 to 0.1 dtex and 0.02 to 0.05 dtex, respectively, and the polyamide:polyester single fiber area ratio of the wefts is 1:1 to 4:1.