TREATMENT MATERIAL FOR DELETERIOUS SUBSTANCE AND MANUFACTURING METHOD THEREOF

PROBLEM TO BE SOLVED: To provide a treatment material for a deleterious substance that absorbs ultraviolet light necessary for photocatalyst activity and that hardly undergoes peeling of a formed transition metal oxide film while maintaining sufficient sterilizing property. SOLUTION: A titanium diox...

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Bibliographische Detailangaben
Hauptverfasser:	WATANABE HIROKAZU, KATO SHINJI, YAMAGUCHI AKISHI, KUROBE HISATOKU, IWATA MISAO, KONDO TSUNEICHI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROMTHE BODY DIFFUSION TREATMENT OF METALLIC MATERIAL HUMAN NECESSITIES HYGIENE INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MEDICAL OR VETERINARY SCIENCE METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a treatment material for a deleterious substance that absorbs ultraviolet light necessary for photocatalyst activity and that hardly undergoes peeling of a formed transition metal oxide film while maintaining sufficient sterilizing property. SOLUTION: A titanium dioxide film 5 inactivates Escherichia Coli or HIV which is incoporatable into a substance to be treated such as components of blood plasma. The control of the film thickness of the titanium dioxide film 5 becomes easy by forming the titanium dioxide film 5 on the surface of a substrate 6 having ultraviolet light penetrability by means of the atmospheric pressure CVD process. When the film thickness of titanium dioxide film 5 is from 1 to 7 μm, the titanium oxide film 5 is able to absorb ultraviolet light necessary for photocatalyst activity and is difficult to be stripped from the substrate 6 while maintaining sufficient antibacterial and sterilizing properties.