WINDOW MEMBER FOR PLASMA PROCESSOR

PROBLEM TO BE SOLVED: To provide a window member for plasma processors which is superior in corrosion resistance to plasma and corrosive gases and easily obtained at a low cost. SOLUTION: The window member for plasma processors such as film forming apparatus, etching apparatus, surface reformers, et...

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Bibliographische Detailangaben
Hauptverfasser:	ICHIJIMA MASAHIKO, SUZUKI SHUNICHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a window member for plasma processors which is superior in corrosion resistance to plasma and corrosive gases and easily obtained at a low cost. SOLUTION: The window member for plasma processors such as film forming apparatus, etching apparatus, surface reformers, etc., is characterized in that at least a surface to be exposed to plasma of a halogen gas is made of a fluoride of at least one element selected among Mg, Ca, Sr and Ba, ZrF4 glass or AlF3 glass, each having a transparency.