ABSORPTION LAYER FORMING METHOD FOR OPTICAL ELEMENT ANALYSIS, OPTICAL ELEMENT ANALYZING METHOD, PROGRAM FOR FORMING ABSORPTION LAYER FOR OPTICAL ELEMENT ANALYSIS, AND OPTICAL ELEMENT ANALYZING PROGRAM

PROBLEM TO BE SOLVED: To make analyzable the behavior of an electromagnetic wave made incident on an optical element having no periodic structure with high accuracy and a small calculation quantity by using RCWA (rigorous coupled-wave analysis) for analyzing the behavior of an electromagnetic wave m...

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Hauptverfasser: WELLNER KLAUS, KODATE KASHIKO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To make analyzable the behavior of an electromagnetic wave made incident on an optical element having no periodic structure with high accuracy and a small calculation quantity by using RCWA (rigorous coupled-wave analysis) for analyzing the behavior of an electromagnetic wave made incident on an optical element having an infinite periodic structure by using an absorption layer. SOLUTION: A function n(1)=1+(p(1)(l/ltot )) +i(p(2)(l/ltot )) is assumed as a function prescribing the refractive index distribution that the absorption layer consisting of a plurality of layers has and a slide simplex method, etc., is used to search a value of a refractive index parameter enabling the absorption layer to actualize a larger electromagnetic absorbing function under a specified restriction condition of the thickness of the absorption layer, thereby forming the absorption layer having the largest electromagnetic absorbing function. A model which is sectioned by the absorption layer is generated as a mathematical model for an optical element to be analyzed and RCWA is applied thereto.