MANUFACTURING TREATMENT SYSTEM OF SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

MANUFACTURING TREATMENT SYSTEM OF SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To provide a manufacturing treatment system or the like of a semiconductor device which can control etching accurately and readily. SOLUTION: The semiconductor device has a holding part 16 which holds information regarding the reference etching rate of an etching object and an...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: HARAKAWA SHOICHI
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a manufacturing treatment system or the like of a semiconductor device which can control etching accurately and readily. SOLUTION: The semiconductor device has a holding part 16 which holds information regarding the reference etching rate of an etching object and an etching rate calculation part 15 which calculates the etching rate when the etching object is etched based on information regarding a pattern formation region of the etching object.