CHEMICALLY AMPLIFYING POSITIVE RADIATION SENSITIVE RESIN COMPOSITION

PROBLEM TO BE SOLVED: To obtain a chemically amplifying positive radiation sensitive resin composition having high sensitivity and high resolution so as to decrease the difference in the resolution of line width in a coarse and fine pattern of a resist in a circuit pattern where both of a coarse pat...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	RI TOKAN, HAMADA TAKAHIRO, MIYAZAKI SHINJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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