PHOTOCATALYST TITANIUM OXIDE FILM OF TWO-LAYER STRUCTURE AND PRODUCTION METHOD THEREOF

PROBLEM TO BE SOLVED: To manufacture a titanium dioxide film which has high photocatalytic activity by forming a film of duplicate structure of Ti2 O3 film and TiO2 film which are subjected to epitaxial growth with the laser abrasion film forming method which allows a manufacture of a flat film with...

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Bibliographische Detailangaben
Hauptverfasser:	YAMAMOTO HARUYA, SUMITA YASUSHI
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F CRYSTAL GROWTH DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SEPARATION SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To manufacture a titanium dioxide film which has high photocatalytic activity by forming a film of duplicate structure of Ti2 O3 film and TiO2 film which are subjected to epitaxial growth with the laser abrasion film forming method which allows a manufacture of a flat film with extremely thin thickness as much as several ten nm (nanometer). SOLUTION: This photocatalyst titanium oxide film and producing method thereof features that the Ti2 O3 film which is subjected to epitaxial growth is formed on a sapphire substrate end, further, the TiO2 film which is subjected to epitaxial growth is formed thereon.