METHOD AND APPARATUS FOR APPLYING COATING LIQUID, AND METHOD FOR ADJUSTING COATING CONDITION OF APPARATUS

PROBLEM TO BE SOLVED: To make a film thickness profile definite by controlling parameters relevant to the discharge mode of a coating liquid fed from a nozzle. SOLUTION: The apparatus is provided with a pressure gauge 15 which measures the parameters corresponding to the discharge mode of the coatin...

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Bibliographische Detailangaben
Hauptverfasser: SASAKI YASUSHI, MORITA AKIHIKO, YANO MORITAKA
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To make a film thickness profile definite by controlling parameters relevant to the discharge mode of a coating liquid fed from a nozzle. SOLUTION: The apparatus is provided with a pressure gauge 15 which measures the parameters corresponding to the discharge mode of the coating liquid from the nozzle 7 as a measured value at least at a point in a coating liquid feeding process, a control part 23 which judges prioriety about the discharge of the coating liquid on the basis of the measured value, and an alarm part 27 which raises an alarm when the discharge of the coating liquid is judged to be inadequate. When a parameter has the same profile, the film thickness has the same profile, accordingly, the propriety about the discharge of the coating liquid can be judged on the basis of the measured value, thereby the film thickness profile is made definite.