METHOD FOR DEPOSITING ZINC OXIDE THIN FILM

PROBLEM TO BE SOLVED: To provide a method for depositing homogenous zinc oxide thin films having satisfactory crystallinity and orientation properties on various base materials in the air to desired thicknesses in a short time. SOLUTION: A zinc oxide thin film is deposited on the surface of a base m...

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Hauptverfasser:	TANAKA OSAMU, KAJITANI TAKAHIRO, SHIKAMA KYOICHI, AZUMA SHUNRYO, MATSUDA HIDEAKI, TANGE YOSHIHIRO, SUZAKI YOSHIFUMI, KOINUMA HIDEOMI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for depositing homogenous zinc oxide thin films having satisfactory crystallinity and orientation properties on various base materials in the air to desired thicknesses in a short time. SOLUTION: A zinc oxide thin film is deposited on the surface of a base material by atmospheric glow discharge plasma produced by using an inert gas. In this method, a gaseous zinc complex with an oxygen-containing compound as a ligand is fed into the plasma, and, further, gaseous oxygen is fed so that its ratio is controlled to