SCANNING TYPE EXPOSURE DEVICE AND EXPOSURE METHOD

PROBLEM TO BE SOLVED: To provide a scanning type exposure device and a method in simple device constitution not inviting increase of a manufacture cost even when an exposure area to be exposed simultaneously becomes large. SOLUTION: In the exposure device for exposing a pattern of a mask on a substr...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	SHIMEKI KOUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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