SCANNING TYPE EXPOSURE DEVICE AND EXPOSURE METHOD

PROBLEM TO BE SOLVED: To provide a scanning type exposure device and a method in simple device constitution not inviting increase of a manufacture cost even when an exposure area to be exposed simultaneously becomes large. SOLUTION: In the exposure device for exposing a pattern of a mask on a substr...

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Bibliographische Detailangaben
1. Verfasser:	SHIMEKI KOUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a scanning type exposure device and a method in simple device constitution not inviting increase of a manufacture cost even when an exposure area to be exposed simultaneously becomes large. SOLUTION: In the exposure device for exposing a pattern of a mask on a substrate while scanning the mask and a photosensitive substrate for a projection optical system, a plurality of the projection optical systems forming an unmagnified horizontally inverted image of the mask pattern are arrayed in a direction perpendicular to a scanning direction so as to bring transfer ranges of the respective projection optical systems into contact or to slightly overlap them and the mask patterns corresponding to the transfer ranges of a plurality of the respective projection optical systems are horizontally inverted and arranged on a mask surface respectively.