CRYSTAL GROWTH METHOD OF COMPOUND SEMICONDUCTOR AND OPTICAL SEMICONDUCTOR DEVICE
PROBLEM TO BE SOLVED: To provide a crystal growth method of a compound semiconductor that grow highly-doped n- and p-type Zn1-x Mgx Sey Te1-y four-element mixed crystals and can easily form the element of a ZnTe-based substance, and to provide an optical semiconductor device. SOLUTION: Molecular bea...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a crystal growth method of a compound semiconductor that grow highly-doped n- and p-type Zn1-x Mgx Sey Te1-y four-element mixed crystals and can easily form the element of a ZnTe-based substance, and to provide an optical semiconductor device. SOLUTION: Molecular beam epitaxy is used on a substrate as a crystal growth method, Al and N are used as impurities, and optimization is made under the growth conditions, thus forming p- and n-type conductive layers for growing highly-doped Zn1-x Mgx Sey Te1-y . |
---|