CORRECTION DATA CHECK METHOD AND DEVICE IN ELECTRON BEAM PLOTTING DEVICE

PROBLEM TO BE SOLVED: To provide a correction data check method and a device in an electron beam plotting device capable of detecting an error of a correction value of a correction map in a short time by simple constitution. SOLUTION: Correction data P and Q stored in two adjacent cells are read fro...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	WAKIMOTO OSAMU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a correction data check method and a device in an electron beam plotting device capable of detecting an error of a correction value of a correction map in a short time by simple constitution. SOLUTION: Correction data P and Q stored in two adjacent cells are read from a correction map memory 25. A computing element 29 obtains an absolute value R(=\|P-Q\|) of a difference between two kinds of the correction data. The absolute value R of the difference is supplied to a comparator 30. In the comparator 30, the absolute value R of the difference and a threshold S set in a threshold resistor 31 are compared. In the case of R>S, an abnormality signal is generated and supplied to a control computer 26. When supplied with the abnormality signal, the control computer 26 displays a coordinate position of the correction data considered as abnormal and the value of the correction data, etc.