TREATMENT APPARATUS, APPARATUS AND METHOD FOR TRANSFER

PROBLEM TO BE SOLVED: To provide a treatment apparatus whose treatment efficiency is high and which can manufacture a high-quality semiconductor device, and to provide an apparatus and a method for a transfer which are used for the treatment apparatus. SOLUTION: The treatment apparatus is provided with a substrate-container mounting base on which a substrate container housing a plurality of substrates to be treated can be mounted, a first transfer chamber whose inside can be maintained at a first atmospheric pressure, a first group of treatment units which are arranged around the first transfer chamber and by which the substrates to be treated are treated under the first atmospheric pressure, a first transfer arm which is arranged and installed inside the first transfer chamber and by which the substrates to be treated are transferred, a second transfer chamber which is installed to be adjacent to the first transfer chamber and whose inside can be maintained at a second atmospheric pressure, a second group of treatment units which are arranged and installed around the second transfer chamber, and by which the substrates to be treated are treated under the second atmospheric pressure and a second transfer arm which is arranged and installed in the second transfer chamber. Two or more of the first transfer arm and/or the second transfer arm exist.