METHOD FOR FORMING GAS/LIQUID IMPERMEABLE LAYER ON SUBSTRATE

PROBLEM TO BE SOLVED: To solve the problem when forming carbon-containing coating on a substrate by aid of arc discharge. SOLUTION: This invention is related to a method for forming a gas/liquid impermeable layer having comparatively high elasticity on a substrate. The elasticity can be attained by...

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Bibliographische Detailangaben
Hauptverfasser:	LIEHR MICHAEL, BUDKE ELISABETH, HACKER VOLKER, GRIMM HELMUT, KREMPEL-HESSE JORG
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To solve the problem when forming carbon-containing coating on a substrate by aid of arc discharge. SOLUTION: This invention is related to a method for forming a gas/liquid impermeable layer having comparatively high elasticity on a substrate. The elasticity can be attained by providing carbon inclusion in a layer made of a metal oxide or of a semiconductor oxide. In order to obtain the carbon inclusion, a metal or a semiconductor is ionized by arc discharge. Then a reactive gas, O2 for example, is introduced and an ionized metal or an ionized semiconductor forms an oxide with the O2 . Further since a carbon-containing gas is added thereto and the gas releases carbon, a carbon-containing oxide layer is formed on the substrate.