LITHOGRAPHIC SYSTEM AND METHOD

PROBLEM TO BE SOLVED: To provide a lithographic system that maintains appropriate throughput performance, and at the same time, can improve connection accuracy in a pattern. SOLUTION: As the multilens of an apparatus for drawing a pattern to a wafer by a plurality of charged beams, a multilens 1 is...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	OKUNUKI MASAHIKO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a lithographic system that maintains appropriate throughput performance, and at the same time, can improve connection accuracy in a pattern. SOLUTION: As the multilens of an apparatus for drawing a pattern to a wafer by a plurality of charged beams, a multilens 1 is used. In the multilens 1, an electronic lens (lens openings 9a to 9i) using the intersection (a lattice point) between lines X1, X2, X3 in a horizontal direction and lines Y1, Y2, Y3 in the vertical direction for composing a virtual lattice as an axis, and electronic lens (lens openings 9j to 9m) using the center of each square for constituting the virtual lattice as an axis.