CHAMBER INNER WALL PROTECTING MEMBER AND PLASMA PROCESSING EQUIPMENT

PROBLEM TO BE SOLVED: To provide a chamber inner wall protecting member for plasma processing equipment which can be used stably for a long period of time, and also to provide a plasma processing chamber provided with the protecting member. SOLUTION: The protecting member is a hollow protecting memb...

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Bibliographische Detailangaben
Hauptverfasser: KAZAMA KOICHI, HAINO KAZUYOSHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a chamber inner wall protecting member for plasma processing equipment which can be used stably for a long period of time, and also to provide a plasma processing chamber provided with the protecting member. SOLUTION: The protecting member is a hollow protecting member for protecting the inner wall of the chamber of the plasma processing equipment, and is formed of a vitreous carbon material in an integrated structure, and has a projecting section extended inwards on the bottom. It is preferred that the vitreous carbon material has such characteristics as a volume specific resistance of 1×10 Ω.cm or smaller and a coefficient of thermal conductivity of 5 W/m.K or larger, and that the thickness of the protecting member is 4 mm or above and an average surface roughness (Ra) of the inner surface is 2.0 μm or below. The chamber inner wall protecting member is disposed along the inner wall of the chamber of the plasma processing equipment, with electrical continuity, established between the inner wall of the chamber and the protecting member and the chamber being grounded.