RUBBING DEVICE

PROBLEM TO BE SOLVED: To regulate the direction of a pile 5 of rubbing cloth 7 and to perform the rubbing without re-adhering the residue of an alignment layer to the alignment layer, in a rubbing device for rubbing a polymer film to a substrate of a liquid crystal panel. SOLUTION: The waste, such a...

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Bibliographische Detailangaben
Hauptverfasser: KOTAKI HITOSHI, KITANI SHINGO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To regulate the direction of a pile 5 of rubbing cloth 7 and to perform the rubbing without re-adhering the residue of an alignment layer to the alignment layer, in a rubbing device for rubbing a polymer film to a substrate of a liquid crystal panel. SOLUTION: The waste, such as the residue of the alignment layer, adhered after the rubbing is performed is removed and the generation of the defect due to re-adhesion of the waste to the alignment layer is reduced by regulating the pile 5 of the rubbing cloth 7 in every rubbing and providing a cleaning mechanism of the rubbing cloth 7 having a groove 6 for removing the waste of the alignment layer and the like adhered to the pile. The pile 5 of the rubbing cloth 7 is regulated in one direction without disorder and the alignment layer having uniform anisotropy can be obtained.