SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a semiconductor device which can prevent an electrical short circuit between an external base electrode and an emitter, and its manufacturing method. SOLUTION: The outer base electrode 5b is electrically connected to a base 5a. An insulation film 6 is formed on the b...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: IMADA KATSUHIRO, HAYASHI MASAMI, FURUKAWA TAISUKE, IKEDA TATSUHIKO, YONEDA KIWA, KAWAMA YOSHITATSU
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator IMADA KATSUHIRO
HAYASHI MASAMI
FURUKAWA TAISUKE
IKEDA TATSUHIKO
YONEDA KIWA
KAWAMA YOSHITATSU
description PROBLEM TO BE SOLVED: To provide a semiconductor device which can prevent an electrical short circuit between an external base electrode and an emitter, and its manufacturing method. SOLUTION: The outer base electrode 5b is electrically connected to a base 5a. An insulation film 6 is formed on the base 5a and the outer base electrode 5b, and a hole 6a partly reaching the surface of the base 5a is formed in the insulation film 6. An emitter electrode 7 is formed on the insulation film 6 so as to contact with the base 5a through the hole 6a. High melting point metal silicide films 8a, 8b are separately formed on the surface of the outer base electrode 5b exposing from the insulation film 6 and on the surface of the emitter electrode 7. The edge 6b of the insulation film 6 is protruded longer than the edge 7a of the emitter electrode 7.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2002353233A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2002353233A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2002353233A3</originalsourceid><addsrcrecordid>eNrjZDAMdvX1dPb3cwl1DvEPUnBxDfN0dlVw9HNR8AwJVvB19At1c3QOCQ3y9HNX8HUN8fB34WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgYGRsamxkbGxo7GRCkCAKeaJwE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD</title><source>esp@cenet</source><creator>IMADA KATSUHIRO ; HAYASHI MASAMI ; FURUKAWA TAISUKE ; IKEDA TATSUHIKO ; YONEDA KIWA ; KAWAMA YOSHITATSU</creator><creatorcontrib>IMADA KATSUHIRO ; HAYASHI MASAMI ; FURUKAWA TAISUKE ; IKEDA TATSUHIKO ; YONEDA KIWA ; KAWAMA YOSHITATSU</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a semiconductor device which can prevent an electrical short circuit between an external base electrode and an emitter, and its manufacturing method. SOLUTION: The outer base electrode 5b is electrically connected to a base 5a. An insulation film 6 is formed on the base 5a and the outer base electrode 5b, and a hole 6a partly reaching the surface of the base 5a is formed in the insulation film 6. An emitter electrode 7 is formed on the insulation film 6 so as to contact with the base 5a through the hole 6a. High melting point metal silicide films 8a, 8b are separately formed on the surface of the outer base electrode 5b exposing from the insulation film 6 and on the surface of the emitter electrode 7. The edge 6b of the insulation film 6 is protruded longer than the edge 7a of the emitter electrode 7.</description><edition>7</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2002</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20021206&amp;DB=EPODOC&amp;CC=JP&amp;NR=2002353233A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20021206&amp;DB=EPODOC&amp;CC=JP&amp;NR=2002353233A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>IMADA KATSUHIRO</creatorcontrib><creatorcontrib>HAYASHI MASAMI</creatorcontrib><creatorcontrib>FURUKAWA TAISUKE</creatorcontrib><creatorcontrib>IKEDA TATSUHIKO</creatorcontrib><creatorcontrib>YONEDA KIWA</creatorcontrib><creatorcontrib>KAWAMA YOSHITATSU</creatorcontrib><title>SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD</title><description>PROBLEM TO BE SOLVED: To provide a semiconductor device which can prevent an electrical short circuit between an external base electrode and an emitter, and its manufacturing method. SOLUTION: The outer base electrode 5b is electrically connected to a base 5a. An insulation film 6 is formed on the base 5a and the outer base electrode 5b, and a hole 6a partly reaching the surface of the base 5a is formed in the insulation film 6. An emitter electrode 7 is formed on the insulation film 6 so as to contact with the base 5a through the hole 6a. High melting point metal silicide films 8a, 8b are separately formed on the surface of the outer base electrode 5b exposing from the insulation film 6 and on the surface of the emitter electrode 7. The edge 6b of the insulation film 6 is protruded longer than the edge 7a of the emitter electrode 7.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2002</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAMdvX1dPb3cwl1DvEPUnBxDfN0dlVw9HNR8AwJVvB19At1c3QOCQ3y9HNX8HUN8fB34WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgYGRsamxkbGxo7GRCkCAKeaJwE</recordid><startdate>20021206</startdate><enddate>20021206</enddate><creator>IMADA KATSUHIRO</creator><creator>HAYASHI MASAMI</creator><creator>FURUKAWA TAISUKE</creator><creator>IKEDA TATSUHIKO</creator><creator>YONEDA KIWA</creator><creator>KAWAMA YOSHITATSU</creator><scope>EVB</scope></search><sort><creationdate>20021206</creationdate><title>SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD</title><author>IMADA KATSUHIRO ; HAYASHI MASAMI ; FURUKAWA TAISUKE ; IKEDA TATSUHIKO ; YONEDA KIWA ; KAWAMA YOSHITATSU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2002353233A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2002</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>IMADA KATSUHIRO</creatorcontrib><creatorcontrib>HAYASHI MASAMI</creatorcontrib><creatorcontrib>FURUKAWA TAISUKE</creatorcontrib><creatorcontrib>IKEDA TATSUHIKO</creatorcontrib><creatorcontrib>YONEDA KIWA</creatorcontrib><creatorcontrib>KAWAMA YOSHITATSU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>IMADA KATSUHIRO</au><au>HAYASHI MASAMI</au><au>FURUKAWA TAISUKE</au><au>IKEDA TATSUHIKO</au><au>YONEDA KIWA</au><au>KAWAMA YOSHITATSU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD</title><date>2002-12-06</date><risdate>2002</risdate><abstract>PROBLEM TO BE SOLVED: To provide a semiconductor device which can prevent an electrical short circuit between an external base electrode and an emitter, and its manufacturing method. SOLUTION: The outer base electrode 5b is electrically connected to a base 5a. An insulation film 6 is formed on the base 5a and the outer base electrode 5b, and a hole 6a partly reaching the surface of the base 5a is formed in the insulation film 6. An emitter electrode 7 is formed on the insulation film 6 so as to contact with the base 5a through the hole 6a. High melting point metal silicide films 8a, 8b are separately formed on the surface of the outer base electrode 5b exposing from the insulation film 6 and on the surface of the emitter electrode 7. The edge 6b of the insulation film 6 is protruded longer than the edge 7a of the emitter electrode 7.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JP2002353233A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T23%3A43%3A40IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=IMADA%20KATSUHIRO&rft.date=2002-12-06&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2002353233A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true