REFLECTIVE PLATE MANUFACTURING METHOD USING REFLECTIVE SUBSTRATE PHOTOSENSITIVE ELEMENT

PROBLEM TO BE SOLVED: To provide a reflective plate manufacturing method for eliminating a problem of a conventional technique and reducing the transfer of a damage generated when the reflective substrate photosensitive element is laminated at the time of production of the reflective plate using the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: YAMAZAKI HIROSHI, FURUBAYASHI HIROMI, MUKAI IKUO
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a reflective plate manufacturing method for eliminating a problem of a conventional technique and reducing the transfer of a damage generated when the reflective substrate photosensitive element is laminated at the time of production of the reflective plate using the reflective substrate photosensitive element. SOLUTION: In the reflective plate manufacturing method, a reflective substrate photosensitive resin layer (b) and a protective film (c) are laminated on the uneven surface of a support film (a), in this order to obtain the reflective substrate photosensitive element. The element is used to laminate the reflective substrate photosensitive resin layer (b) and the uneven support film (a), on a substrate, while peeling the protective film (c). Next, the support film (a) is exposed to scattered beam from above to be removed.