SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus which contains an in-line monitor, interposed between a certain substrate treatment process and the following substrate treating process in an in-line manner, and is capable of returning a processed substrate to a semiconductor...

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Bibliographische Detailangaben
Hauptverfasser: BOKU YOSHIHIRO, TAKAHASHI YOSHIAKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus which contains an in-line monitor, interposed between a certain substrate treatment process and the following substrate treating process in an in-line manner, and is capable of returning a processed substrate to a semiconductor production line, after the processed substrate has been subjected to a partially destructive test. SOLUTION: A specimen is picked up from a processed substrate by the use of a focused ion beam in an in-line monitor, and the processed substrate which has been subjected to processing is cleaned to satisfy the cleanliness level required for the following substrate treatment and then returned to a semiconductors production line.