NOVEL ACID-LABILE POLYMER AND RESIST COMPOSITION CONTAINING THE SAME

PROBLEM TO BE SOLVED: To provide a novel polymer which can be used to compose a useful resist for a minute processing using various radial rays and a resist composition containing the polymer. SOLUTION: This acid-labile polymer is represented by the formula 1 wherein R1 , R2 and R6 are each a 1-34C...

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Bibliographische Detailangaben
Hauptverfasser:	PARK JOOHYEON, LIM YOUNGTAEK, JOO HYUNSANG, CHO SEONGDUK, KIM SEONGJU, SEO DONGUL
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a novel polymer which can be used to compose a useful resist for a minute processing using various radial rays and a resist composition containing the polymer. SOLUTION: This acid-labile polymer is represented by the formula 1 wherein R1 , R2 and R6 are each a 1-34C alkyl group, alkoxymethylene group, alkoxyethylene group or the like; R5 is a hydrogen atom, a 1-18C alkyl or alkoxy group; R7 is a hydrogen atom, a 1-18C alkyl group, an alkyl group containing a 1-18C alkoxy or ester group; R3 and R4 are each a hydrogen atom, hydroxy group, nitrile group, 1-18C alkylcarbonyloxy group, 1-18C alkyl group or the like; X is a 1-40C olefin derivative, 1-40C vinyl ether derivative or 1-40C styrene derivative.