WET TREATING DEVICE

PROBLEM TO BE SOLVED: To provide a wet treating device having a liquid draining mechanism which can efficiently drain a treating liquid left on a substrate. SOLUTION: In the wet treating device, a substrate having a stripe pattern films thereon is treated chemically or physically with a prescribed l...

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1. Verfasser: NISHIMURA SUKEYUKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a wet treating device having a liquid draining mechanism which can efficiently drain a treating liquid left on a substrate. SOLUTION: In the wet treating device, a substrate having a stripe pattern films thereon is treated chemically or physically with a prescribed liquid and the liquid left on the substrate is drained being blown out by long liquid drain nozzles having slit-like air outlets while the substrate is conveyed in the direction orthogonal to the stripe pattern. This device comprises at least two liquid drain nozzles which are reversely inclined in the direction orthogonal to the conveying direction A of the substrate G. Since the liquid is drained in two oblique directions so as to be swept out toward both sides of the substrate G, the treating liquid left on the substrate can be efficiently drained from the substrate, which eliminates problems caused by the liquid in the wet treating left on the substrate.